About This Archive  | DCHAS-L 2012 Index   | DCHAS-L Yearly Index
person wearing a disposable face shield and surgical style mask

Check out Safety Emporium for your N95, N99, and face shield needs.

Previous by Date:
Subject: [DCHAS-L] ACS Laboratory Chemical and Hazardous Waste Task Force
Date: July 5, 2012 2:17:49 PM EDT
Author: "Robin M. Izzo" 		Next by Date:
Subject: Re: [DCHAS-L] Lab coat selection information?
Date: July 5, 2012 7:27:51 PM EDT
Author: "Gibson, James"

From: Rortvedt deZero <rortvedt**At_Symbol_Here**HOTMAIL.COM>
Subject: [DCHAS-L] Plasma etcher
Date: July 5, 2012 4:10:41 PM EDT
Reply-To: DCHAS-L <DCHAS-L**At_Symbol_Here**MED.CORNELL.EDU>
Message-ID: <1B4D1665F78352429F7714A6540EB036294461CD**At_Symbol_Here**MBXE-01.exchange.cornell.edu>


 

One of our researchers will get a plasma etching system. The manufacturer mentioned that a scrubber may be required on the vacuum line when he uses CF4 and produces SiF4.

Is anyone familiar with these devices who can provide safety/environmental/waste guidance?

Are the levels of SiF4 high enough to affect the ventilation system?

Thanks.

Ralph North, CHMM
Environmental Affairs Specialist
University of Wisconsin System
Office of Safety and Loss Prevention
780 Regent St.
Madison, WI 53715-2635
rnorth**At_Symbol_Here**uwsa.edu
(608) 263-4419

Previous post   |  Top of Page   |   Next post


The content of this page reflects the personal opinion(s) of the author(s) only, not the American Chemical Society, ILPI, Safety Emporium, or any other party. Use of any information on this page is at the reader's own risk. Unauthorized reproduction of these materials is prohibited. Send questions/comments about the archive to secretary@dchas.org.
The maintenance and hosting of the DCHAS-L archive is provided through the generous support of Safety Emporium.